Chemnitz, T. (Corresponding Author)MLZ*

2014

Abstract: In the context of the development of high density uranium-molybdenum nuclear fuel (hereinafter referred to as U-Mofuel) at the Forschungs-Neutronenquelle HeinzMaier-Leibnitz (FRM II), the prevention of the formation of interdiffusion layers between the U-Mo fuel and the aluminum cladding has become one major research focus. The phenomenonof interdiffusion can be avoided by inserting a thin barrier consisting of suitable materials. One method to apply these very thin layers is sputtering. Although being used widely in thin-film technology, little experience exists with these methods regarding the requirements of nuclear technology. Therefore, the construction of a flexible sputtering device was necessary in order to investigate a wide range of parameters such as the substrate temperature, a substrate bias voltage or the pressure of the process gas respectively. The present thesis will proof that the sputtering device meets the technical requirements. This includes ensuring a sufficient flow of cooling water through the different components and choosing a suitable medium for heat conduction between the target and the sputtering device itself. Furthermore a basic characterization will be carried out by determining theheat-power characteristic of the substrate holder, the pressure-ignition voltage characteristic of the sputtering device as wellas the burn up behavior of the target material. The knowledge of those parameters will on the one hand ensure a safe and secure normal operation of the sputtering device and will on the other hand be of help in influencing the growth of the layer on the substrate in a desired manner and thereby adjust the properties of the interdiffusion barrier as needed.

Keyword(s): Others (1st) ; Instrument and Method Development (2nd) ; Unveröffentlichte Hochschulschrift

1. RPHYSICS (RPHYSICS)
2. DOMUSER (DOMUSER)
3. MATSCI (MATSCI)
4. EDV (EDV)

1. HEU-MEU: Brennstoffentwicklung